Sub-10-nm-resolution electron-beam lithography toward very-high-density multilevel 3D nano-magnetic information devices

ISSN： 1388-0764

Source： Journal of Nanoparticle Research, Vol.15, Iss.6, 2013-06, pp. : 1-8

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Simulations of electron-beam transport in solid-density targets and the role of magnetic collimation

Journal of Physics: Conference Series , Vol. 244, Iss. 2, 2010-08 ,pp. : 251-254

IOP Publishing

Access to resources Recommend Favorite

Electron-beam lithography simulation for EUV mask applications

Journal of Physics: Conference Series , Vol. 10, Iss. 1, 2005-01 ,pp. : 385-388

IOP Publishing

Access to resources Recommend Favorite

Fabrication of ordered GaAs nanowhiskers using electron-beam lithography

By Soshnikov I. Afanas'ev D. Cirlin G. Petrov V. Tanklevskaya E. Samsonenko Yu. Bouravlev A. Khrebtov A. Ustinov V.

Semiconductors, Vol. 45, Iss. 6, 2011-06 ,pp. : 822-827

MAIK Nauka/Interperiodica

Access to resources Recommend Favorite

Tapping mode SPM local oxidation nanolithography with sub-10 nm resolution

Journal of Physics: Conference Series , Vol. 100, Iss. 5, 2008-03 ,pp. : 88-91

IOP Publishing

Access to resources Recommend Favorite

Multilevel diffractive elements in SiO2 by electron beam lithography and proportional etching with analogue negative resist

By Laakkonen Pasi Lautanen Jari Kettunen Ville Turunen Jari Schirmer Matthias

Journal of Modern Optics, Vol. 46, Iss. 8, 1999-07 ,pp. : 1295-1307

Taylor & Francis Ltd

Access to resources Recommend Favorite