Atomic layer deposition of high-density Pt nanodots on Al 2 O 3 film using (MeCp)Pt(Me) 3 and O 2 precursors for nonvolatile memory applications

Author： Ding Shi-Jin

Publisher： Springer Publishing Company

ISSN： 1931-7573

Source： Nanoscale Research Letters, Vol.8, Iss.1, 2013-12, pp. : 1-7

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