Pattern evolution of crystalline Ge aggregates during annealing of an Al/Ge bilayer film deposited on a SiO2 substrate

Author： Doi M.   Suzuki Y.   Koyama T.   Katsuki F.  

Publisher： Taylor & Francis Ltd

ISSN： 1362-3036

Source： Philosophical Magazine Letters, Vol.78, Iss.3, 1998-09, pp. : 241-245

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