Hydrogen-plasma etching of hydrogenated amorphous silicon: a study by a combination of spectroscopic ellipsometry and trap-limited diffusion model

Author： Kaïl F.

Publisher： Taylor & Francis Ltd

ISSN： 1478-6443

Source： Philosophical Magazine, Vol.84, Iss.6, 2004-02, pp. : 595-609

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Spectroscopic ellipsometry study of amorphous silicon anodically oxidised

By Aguas H. Goncalves A. Pereira L. Silva R. Fortunato E. Martins R.

Thin Solid Films, Vol. 427, Iss. 1, 2003-03 ,pp. : 345-349

Elsevier

Access to resources Recommend Favorite

Amorphous hydrogenated carbon films used as masks for silicon microtips fabrication in a reactive ion etching with SF 6 plasma

By Alves M.A.R. Porto L.F. de Faria P.H.L. Braga E.S.

Vacuum, Vol. 72, Iss. 4, 2004-01 ,pp. : 485-488

Elsevier

Access to resources Recommend Favorite

Ellipsometry and Raman study on hydrogenated amorphous carbon (a-C:H) films deposited in a dual ECR-r.f. plasma

By Hong J. Goullet A. Turban G.

Thin Solid Films, Vol. 352, Iss. 1, 1999-09 ,pp. : 41-48

Elsevier

Access to resources Recommend Favorite

The influence of hydrogen dilution ratio on the crystallization of hydrogenated amorphous silicon films prepared by plasma-enhanced chemical vapor deposition

By Kim H.-Y. Lee K.-Y. Lee J.-Y.

Thin Solid Films, Vol. 302, Iss. 1, 1997-06 ,pp. : 17-24

Elsevier

Access to resources Recommend Favorite

Effect of hydrogen dilution on the optical properties of hydrogenated amorphous silicon prepared by plasma deposition

By Yamaguchi Masaaki Morigaki Kazuo

Philosophical Magazine B, Vol. 79, Iss. 3, 1999-03 ,pp. : 387-405

Taylor & Francis Ltd

Access to resources Recommend Favorite