Hydrogen-plasma etching of hydrogenated amorphous silicon: a study by a combination of spectroscopic ellipsometry and trap-limited diffusion model

By Kaïl F.  

Philosophical Magazine, Vol. 84, Iss. 6, 2004-02 ,pp. : 595-609

Taylor & Francis Ltd

Access to resources Recommend Favorite

In situ measurement of the crystallization of amorphous silicon in a vertical furnace using spectroscopic ellipsometry

By Petrik P.   Lehnert W.   Schneider C.   Lohner T.   Fried M.   Gyulai J.   Ryssel H.  

Thin Solid Films, Vol. 383, Iss. 1, 2001-02 ,pp. : 235-240

Elsevier

Access to resources Recommend Favorite

Thickness change in an annealed amorphous silicon film detected by spectroscopic ellipsometry

By Yamaguchi T.   Kaneko Y.   Jayatissa A.H.   Aoyama M.  

Thin Solid Films, Vol. 279, Iss. 1, 1996-06 ,pp. : 174-179

Elsevier

Access to resources Recommend Favorite

Spectroscopic ellipsometry on silicon-oxide films on silicon

By Jungk G.   Grabolla T.  

Thin Solid Films, Vol. 335, Iss. 1, 1998-11 ,pp. : 253-257

Elsevier

Access to resources Recommend Favorite

Characterization of different porous silicon structures by spectroscopic ellipsometry

By Fried M.   Lohner T.   Polgar O.   Petrik P.   Vazsonyi E.   Barsony I.   Piel J.P.   Stehle J.L.  

Thin Solid Films, Vol. 276, Iss. 1, 1996-04 ,pp. : 223-227

Elsevier

Access to resources Recommend Favorite