Author: Harris Peter
Publisher: Taylor & Francis Ltd
ISSN: 1478-6443
Source: Philosophical Magazine, Vol.91, Iss.18, 2011-06, pp. : 2355-2363
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
High yield production of C 74 using an arc-discharge plasma
By Hatakeyama R. Hirata T. Ishida H. Hayashi T. Sato N.
Thin Solid Films, Vol. 316, Iss. 1, 1998-03 ,pp. :
Deposition of low-resistivity ITO on plastic substrates by DC arc-discharge ion plating
By Niino F. Hirasawa H. Kondo K.-i.
Thin Solid Films, Vol. 411, Iss. 1, 2002-05 ,pp. :
ANGEWANDTE CHEMIE INTERNATIONAL EDITION, Vol. 54, Iss. 45, 2015-11 ,pp. :