High yield production of C 74 using an arc-discharge plasma

Author: Hatakeyama R.   Hirata T.   Ishida H.   Hayashi T.   Sato N.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.316, Iss.1, 1998-03, pp. : 51-55

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Abstract