Oxide removal from copper by using argon and fluorocarbon plasma treatment

By Falkenstein Z.   Hakovirta M.   Nastasi M.  

Thin Solid Films, Vol. 381, Iss. 1, 2001-01 ,pp. : 84-87

Elsevier

Access to resources Recommend Favorite

Mechanism and analytical models for the gas distribution on the SiC foam monolithic tray

By  

AICHE JOURNAL, Vol. 61, Iss. 12, 2015-12 ,pp. : 4509-4516

John Wiley & Sons Inc

Access to resources Recommend Favorite

Measurements of negative ion density in fluorocarbon ECR plasma

By Shindo M.   Ueda Y.   Kawakami S.   Ishii N.   Kawai Y.  

Vacuum, Vol. 59, Iss. 2, 2000-11 ,pp. : 708-715

Elsevier

Access to resources Recommend Favorite

Amorphous hydrogenated carbon films used as masks for silicon microtips fabrication in a reactive ion etching with SF 6 plasma

By Alves M.A.R.   Porto L.F.   de Faria P.H.L.   Braga E.S.  

Vacuum, Vol. 72, Iss. 4, 2004-01 ,pp. : 485-488

Elsevier

Access to resources Recommend Favorite

Co-operation process of plasma CVD and sputtering, using methane, SF 6 and Ar mixture gas, and gold plate discharge electrode

By Matsushita M.   Kashem A.   Morita S.  

Thin Solid Films, Vol. 407, Iss. 1, 2002-03 ,pp. : 50-53

Elsevier

Access to resources Recommend Favorite