Co-operation process of plasma CVD and sputtering, using methane, SF 6 and Ar mixture gas, and gold plate discharge electrode

Author： Matsushita M.   Kashem A.   Morita S.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.407, Iss.1, 2002-03, pp. : 50-53

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