Transformation of amorphous Si 0.9 Ge 0.1 and Si films by laser annealing

Author： Wode S.-A. Dettmer K. Kessler F.R.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.266, Iss.1, 1995-09, pp. : 78-82

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