Study of the material properties and suitability of plasma-deposited fluorine-doped silicon dioxides for low dielectric constant interlevel dielectrics

Author： Shannon V.L.   Karim M.Z.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.270, Iss.1, 1995-12, pp. : 498-502

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