Dielectric constant and stability of fluorine doped PECVD silicon oxide thin films

Author： Lee P.   Mizuno S.   Verma A.   Tran H.   Nguyen B.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.283, Iss.1, 1996-09, pp. : 30-36

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