Evaluation of porosity and composition in reactively r.f.-sputtered Ti 1-x ,Zr x N films

Author： Jin P. Nakao S. Tanemura S. Maruno S.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.271, Iss.1, 1995-12, pp. : 19-25

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Structural and optical properties of r.f.-sputtered Si x C 1-x :O films

By Ech-Chamikh E. Ameziane E.L. Bennouna A. Azizan M. Nguyen Tan T.A. Lopez-Rios T.

Thin Solid Films, Vol. 259, Iss. 1, 1995-04 ,pp. : 18-24

Elsevier

Access to resources Recommend Favorite

Plasma substrate interaction effects on composition and chemical structure of reactively r.f. magnetron sputtered carbon nitride films 1

By Kaltofen R. Sebald T. Schulte J. Weise G.

Thin Solid Films, Vol. 347, Iss. 1, 1999-06 ,pp. : 31-38

Elsevier

Access to resources Recommend Favorite

Conductivity of r.f.-sputtered Ni 100-x - Si x thin films with 33=

By Belu-Marian A. Serbanescu M.D. Manaila R. Malis O. Devenyi A. Ivanov E.

Thin Solid Films, Vol. 259, Iss. 1, 1995-04 ,pp. : 105-112

Elsevier

Access to resources Recommend Favorite

Modeling of reactively sputtered TiAlN films

By Lii D.-F. Huang J.-L. Shew B.-Y.

Thin Solid Films, Vol. 335, Iss. 1, 1998-11 ,pp. : 122-126

Elsevier

Access to resources Recommend Favorite

Crystallization behavior of r.f.-sputtered TiNi thin films

By Chen J.Z. Wu S.K.

Thin Solid Films, Vol. 339, Iss. 1, 1999-02 ,pp. : 194-199

Elsevier

Access to resources Recommend Favorite