Author： Wang R. Fichthorn K.A.
Publisher： Elsevier
ISSN： 0040-6090
Source： Thin Solid Films, Vol.272, Iss.2, 1996-01, pp. : 223-228
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Computer simulation of metal-on-metal epitaxy
By Breeman M. Langelaar M.H. Boerma D.O. Barkema G.T.
Thin Solid Films, Vol. 272, Iss. 2, 1996-01 ,pp. :
Access to resources
Recommend
Computer simulation of semicontinuous and continuous metal film morphology
By Hrach R. Novotny D. Novak S. Pavlik J.
Vacuum, Vol. 50, Iss. 3, 1998-07 ,pp. :
Ellipsometry and transport studies of thin-film metal nitrides
By Humlcek J. Nebojsa A. Hora J. Strasky M. Spousta J. Sikola T.
Thin Solid Films, Vol. 332, Iss. 1, 1998-11 ,pp. :
Study of thin film growth by means of computer simulation and image analysis
By Hrach R. Simek J. Kostern M.
Vacuum, Vol. 67, Iss. 2, 2002-09 ,pp. :