SiC thin film preparation by ArF excimer laser chemical vapor deposition Part 1: Rate of photolysis of alkylsilanes by ArF excimer laser and their decomposition products

Author： Watanabe A.   Osato K.   Ninomiya S.   Mukaida M.   Tsunoda T.   Imai Y.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.274, Iss.1, 1996-03, pp. : 70-75

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