Characterization of silicon-implanted SiO 2 layers using positron annihilation spectroscopy

Author: Ghislotti G.   Nielsen B.   Asoka-Kumar P.   Lynn K.G.   Szeles C.   Bottani C.E.   Bertoni S.   Cerofolini G.F.   Meda L.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.276, Iss.1, 1996-04, pp. : 310-313

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