Grain boundary enhanced oxygen out-diffusion in annealed polycrystalline Si/SiO 2 /crystalline Si structures

Author： Devine R.A.B.   Mathiot D.   Xu J.-B.   Wilson I.H.   Gauneau M.   Warren W.L.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.286, Iss.1, 1996-09, pp. : 317-320

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