Author: Gotoh Y. Yoshii H. Amioka T. Kameyama K. Tsuji H. Ishikawa J.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.288, Iss.1, 1996-11, pp. : 300-308
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
A-SiSn( x ):H thin films prepared by ion beam assisted deposition
Thin Solid Films, Vol. 286, Iss. 1, 1996-09 ,pp. :
Nanocrystalline silicon carbonitride thin films prepared by plasma beam-assisted deposition
By Cao Z.X.
Thin Solid Films, Vol. 401, Iss. 1, 2001-12 ,pp. :