Effect of process parameters on glow discharge and film thickness uniformity in facing target sputtering

Author: Modhan S.   Senthil Nathan S.   Muralidhar G.K.   Modhan Rao G.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.292, Iss.1, 1997-01, pp. : 20-25

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Abstract