Characteristics of indium tin oxide films deposited by r.f. magnetron sputtering

By McClure J.C.   Joshi R.N.   Singh V.P.  

Thin Solid Films, Vol. 257, Iss. 1, 1995-02 ,pp. : 32-35

Elsevier

Access to resources Recommend Favorite

Investigations on the crystallisation properties of RF magnetron sputtered indium tin oxide thin films

By Thilakan P.   Minarini C.   Loreti S.   Terzini E.  

Thin Solid Films, Vol. 388, Iss. 1, 2001-06 ,pp. : 34-40

Elsevier

Access to resources Recommend Favorite

Properties of indium tin oxide (ITO) films prepared by r.f. reactive magnetron sputtering at different pressures

By Meng L.-J.   Dos Santos M.P.  

Thin Solid Films, Vol. 303, Iss. 1, 1997-07 ,pp. : 151-155

Elsevier

Access to resources Recommend Favorite

Determination of the mechanical properties of r.f.-magnetron-sputtered zinc oxide thin films on substrates

By Han M.-Y.   Jou J.-H.  

Thin Solid Films, Vol. 260, Iss. 1, 1995-05 ,pp. : 58-64

Elsevier

Access to resources Recommend Favorite

Comparative study on structure and internal stress in tin-doped indium oxide and indium-zinc oxide films deposited by r.f. magnetron sputtering

By Sasabayashi T.   Ito N.   Nishimura E.   Kon M.   Song P.K.   Utsumi K.   Kaijo A.   Shigesato Y.  

Thin Solid Films, Vol. 445, Iss. 2, 2003-12 ,pp. : 219-223

Elsevier

Access to resources Recommend Favorite