Properties of indium tin oxide (ITO) films prepared by r.f. reactive magnetron sputtering at different pressures

Author: Meng L.-J.   Dos Santos M.P.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.303, Iss.1, 1997-07, pp. : 151-155

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Abstract