X-ray reflectivity analysis of thin TiN and TiO x N y films deposited by dual-ion-beam sputtering on (100)Si substrates

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Elsevier

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Characteristics of Fe-N films deposited by a reactive ion beam sputtering using adsorptive and ionized nitrogen

By Iwatsubo S.   Naoe M.  

Vacuum, Vol. 66, Iss. 3, 2002-08 ,pp. : 251-256

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Nanoscaled composite TiN/Cu multilayer thin films deposited by dual ion beam sputtering: growth and structural characterisation

By Abadias G.   Tse Y.Y.   Michel A.   Jaouen C.   Jaouen M.  

Thin Solid Films, Vol. 433, Iss. 1, 2003-06 ,pp. : 166-173

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Microstructural study of iron nitride thin films deposited by ion beam sputtering

By Gupta M.   Gupta A.   Chaudhari S.M.   Phase D.M.   Ganesan V.   Rama Rao M.V.   Shripathi T.   Dasannacharya B.A.  

Vacuum, Vol. 60, Iss. 4, 2001-03 ,pp. : 395-399

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Microstructure and tribological characteristics of multilayer films deposited by ion-beam mixing

By Zhang W.   Zhang X.   Yang D.   Xue Q.  

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