Formation of ultra-shallow junctions using epitaxial CoSi 2 thin film as diffusion sources

Author: Bae K.S.   Kim J.R.   Hong S.Y.   Park Y.B.   Cho Y.S.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.302, Iss.1, 1997-06, pp. : 260-265

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Abstract