Retarded diffusion of boron in Si due to the formation of an epitaxial CoSi 2 layer

Author: Kappius L.   Bay H.L.   Mantl S.   Tyagi A.K.   Breuer U.   Becker J.S.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.336, Iss.1, 1998-12, pp. : 26-28

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Abstract