Tantalum plasma etching with minimum effect on underlying nickel-iron thin film

Author： Hsiao R. Miller D. Lin T. Robertson N.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.304, Iss.1, 1997-07, pp. : 381-385

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Electrochemical redox behavior of nickel-iron cyanide film deposited onto indium tin oxide substrate

By Kuwabara K. Yamada S. Koumoto K.

Thin Solid Films, Vol. 292, Iss. 1, 1997-01 ,pp. : 227-231

Elsevier

Access to resources Recommend Favorite

Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties

By Kim H. Rossnagel S.M.

Thin Solid Films, Vol. 441, Iss. 1, 2003-09 ,pp. : 311-316

Elsevier

Access to resources Recommend Favorite

Tantalum Thin-Film Superconducting Transition Edge Thermometers

By Mohazzab M. Mulders N. Nash A. Larson M.

Journal of Low Temperature Physics, Vol. 121, Iss. 5-6, 2000-12 ,pp. : 821-824

Springer Publishing Company

Access to resources Recommend Favorite

Study of organic thin film transistors based on nickel phthalocyanine: effect of annealing

By Ben Chaabane R. Ltaief A. Dridi C. Rahmouni H. Bouazizi A. Ben Ouada H.

Thin Solid Films, Vol. 427, Iss. 1, 2003-03 ,pp. : 371-376

Elsevier

Access to resources Recommend Favorite

The etching characteristics of SrBi 2 Ta 2 O 9 thin film in CF 4 /Ar plasma using magnetically enhanced inductively coupled plasma

By Kim D.-P. Kim C.-I.

Thin Solid Films, Vol. 385, Iss. 1, 2001-04 ,pp. : 162-166

Elsevier

Access to resources Recommend Favorite