UHV reflection electron microscopy investigation of the monoatomic steps on the silicon (111) surface at homo- and heteroepitaxial growth

Author: Latyshev A.V.   Krasilnikov A.B.   Aseev A.L.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.306, Iss.2, 1997-09, pp. : 205-213

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Abstract