The effects of phosphorus on the crystallisation and photoluminescence behaviour of aerosol-gel deposited SiO 2 -TiO 2 -Er 2 O 3 -P 2 O 5 thin films

By Coutier C.   Meffre W.   Jenouvrier P.   Fick J.   Audier M.   Rimet R.   Jacquier B.   Langlet M.  

Thin Solid Films, Vol. 392, Iss. 1, 2001-07 ,pp. : 40-49

Elsevier

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Aerosol-gel deposition and low temperature heat-treatment of SiO 2 layers

By Vautey C.   Burgos M.   Langlet M.  

Thin Solid Films, Vol. 347, Iss. 1, 1999-06 ,pp. : 184-194

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Rapid thermal annealing effects on plasma deposited SiO x :H films

By San Andres E.   del Prado A.   Martil I.   Gonzalez Daz G.   Martinez F.L.   Bravo D.   Lopez F.J.  

Vacuum, Vol. 67, Iss. 3, 2002-09 ,pp. : 531-536

Elsevier

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Aerosol-gel preparation of optically active layers in the system Er/SiO 2 -TiO 2

By Coutier C.   Audier M.   Fick J.   Rimet R.   Langlet M.  

Thin Solid Films, Vol. 372, Iss. 1, 2000-09 ,pp. : 177-189

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Influence of vacuum rapid thermal annealing on the properties of PCVD SiO 2 and SiO 2 .P 2 O 5 films

By Dimitrov D.B.   Beshkova M.   Dafinova R.  

Vacuum, Vol. 58, Iss. 2, 2000-08 ,pp. : 485-489

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