Rapid thermal annealing effects on plasma deposited SiO x :H films

Author: San Andres E.   del Prado A.   Martil I.   Gonzalez Daz G.   Martinez F.L.   Bravo D.   Lopez F.J.  

Publisher: Elsevier

ISSN: 0042-207X

Source: Vacuum, Vol.67, Iss.3, 2002-09, pp. : 531-536

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Abstract