Application of high energy resolved X-ray emission spectroscopy for monitoring of silicide formation in Co/SiO 2 /Si system

Author： Kurmaev E.Z.   Shamin S.N.   Galakhov V.R.   Kasko I.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.311, Iss.1, 1997-12, pp. : 28-32

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