Silicide formation and stability of Ti/SiGe and Co/SiGe

Author: Wang Z.   Aldrich D.B.   Chen Y.L.   Sayers D.E.   Nemanich R.J.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.270, Iss.1, 1995-12, pp. : 555-560

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Abstract