An ab-initio molecular-orbital analysis on the initial plasma CVD process of a-Si:H film on glass substrate

Author： Miyazaki K.   Nakajima K.   Sato K.   Koinuma H.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.316, Iss.1, 1998-03, pp. : 134-138

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