Author: Jiang Z. Xu A. Hu D. Zhu H. Liu X. Wang X. Mao M. Zhang X. Hu J. Huang D. Wang X.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.321, Iss.1, 1998-05, pp. : 116-119
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Enhancement of thermal diffusion of delta-doped Sb in SiGe
By Nakagawa K. Kojima H. Sugii N. Yamaguchi S. Miyao M.
Thin Solid Films, Vol. 369, Iss. 1, 2000-07 ,pp. :
Sb segregation in Si and SiGe: effect on the growth of self-organised Ge dots
By Portavoce A. Volpi F. Ronda A. Gas P. Berbezier I.
Thin Solid Films, Vol. 380, Iss. 1, 2000-12 ,pp. :