Formation of thin gate oxides on SiGe with atomic oxygen

Author: Ogryzlo E.A.   Zheng L.   Heinrich B.   Myrtle K.   Lafontaine H.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.321, Iss.1, 1998-05, pp. : 196-200

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract