Substrate influence on the formation of FeSi and FeSi 2 films from cis-Fe(SiCl 3 ) 2 (CO) 4 by LPCVD

Author： Luo L. Zybill C.E. Ang H.G. Lim S.F. Chua D.H.C. Lin J. Wee A.T.S. Tan K.L.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.325, Iss.1, 1998-07, pp. : 87-91

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