Measurement of the striking force of Ar ions on the substrate during sputter deposition of a-Si:H thin films

By Aida M.S.   Rahmane S.  

Thin Solid Films, Vol. 288, Iss. 1, 1996-11 ,pp. : 83-85

Elsevier

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Degradation during sputter deposition of solid electrolyte thin films for microsystems

By Seguin J.-L.   Lambert-Mauriat C.   Aguir K.   Bendahan M.   Jacolin C.   Lauque P.  

Thin Solid Films, Vol. 422, Iss. 1, 2002-12 ,pp. : 87-91

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Phase evolution during crystallization of sputter-deposited amorphous titanium-aluminium alloy thin films: dimensional and solute effects

By Banerjee Rajarshi   Swaminathan Subramanian   Wheeler Robert   Fraser Hamish L.  

Philosophical Magazine. A. Physics of Condensed Matter. Defects and Mechanical Properties, Vol. 80, Iss. 8, 2000-08 ,pp. : 1715-1727

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ITO thin films deposited at low temperatures using a kinetic energy controlled sputter-deposition technique

By Hoshi Y.   Kiyomura T.  

Thin Solid Films, Vol. 411, Iss. 1, 2002-05 ,pp. : 36-41

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Monte Carlo simulations of sputter deposition and step coverage of thin films

By Coronell D.G.   Egan E.W.   Hamilton G.   Jain A.   Venkatraman R.   Weitzman B.  

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