Non-catalytic displacement plating (NCDP) of photosensitive semiconducting thin films1,2,3

Author： Kumar M.   Sharan M.K.   Sharon M.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.333, Iss.1, 1998-11, pp. : 287-294

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Non-catalytic displacement plating (NCDP) of photosensitive semiconducting thin films

By Sharon M.   Kumar M.   Sharan M.K.  

Thin Solid Films, Vol. 312, Iss. 1, 1998-01 ,pp. : 139-146

Elsevier

Access to resources Recommend Favorite

Influence of semiconducting electrodes on properties of thin ferroelectric films

By  

PHYSICA STATUS SOLIDI (B) BASIC SOLID STATE PHYSICS, Vol. 243, Iss. 2, 2006-02 ,pp. : 542-554

John Wiley & Sons Inc

Access to resources Recommend Favorite

Semiconducting asphaltene thin films: preparation and characterization

By  

PHYSICA STATUS SOLIDI (C) - CURRENT TOPICS IN SOLID STATE PHYSICS, Vol. 12, Iss. 6, 2015-06 ,pp. : 553-555

John Wiley & Sons Inc

Access to resources Recommend Favorite

The optical band gap of semiconducting iron disilicide thin films

By Ozvold M.   Bohac V.   Luby S.   Majkova E.   Mrafko P.   Gasparik V.   Leggieri G.   Luches A.  

Thin Solid Films, Vol. 263, Iss. 1, 1995-07 ,pp. : 92-98

Elsevier

Access to resources Recommend Favorite

Atomic Layer Deposition of p‐Type Semiconducting Thin Films: a Review

By  

ADVANCED MATERIALS INTERFACES (ELECTRONIC), Vol. 4, Iss. 24, 2017-12 ,pp. : n/a-n/a

John Wiley & Sons Inc

Access to resources Recommend Favorite