Publisher： John Wiley & Sons Inc
E-ISSN： 2196-7350|4|24|admi.201700300-admi.201700300
ISSN： 2196-7350
Source： ADVANCED MATERIALS INTERFACES (ELECTRONIC), Vol.4, Iss.24, 2017-12, pp. : n/a-n/a
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Previous Menu Next
Abstract
Related content
Atomic layer deposition of BN thin films
By Marlid B. Ottosson M. Pettersson U. Larsson K. Carlsson J.-O.
Thin Solid Films, Vol. 402, Iss. 1, 2002-01 ,pp. :
Access to resources
Recommend
Introducing atomic layer epitaxy for the deposition of optical thin films
By Ritala M. Riihela D. Matero R. Leskela M.
Thin Solid Films, Vol. 289, Iss. 1, 1996-11 ,pp. :
Effect of water dose on the atomic layer deposition rate of oxide thin films
By Matero R. Rahtu A. Ritala M. Leskela M. Sajavaara T.
Thin Solid Films, Vol. 368, Iss. 1, 2000-06 ,pp. :
Properties of tantalum oxide thin films grown by atomic layer deposition
By Kukli K. Aarik J. Aidla A. Kohan O. Uustare T. Sammelselg V.
Thin Solid Films, Vol. 260, Iss. 2, 1995-05 ,pp. :