Author: Laux S. Kaiser N. Zoller A. Gotzelmann R. Lauth H. Bernitzki H.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.335, Iss.1, 1998-11, pp. : 1-5
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Room-temperature deposition of a-SiC:H thin films by ion-assisted plasma-enhanced CVD
Thin Solid Films, Vol. 283, Iss. 1, 1996-09 ,pp. :
Microstructure of indium oxide films in oxygen ion-assisted deposition
By Cho J.-S. Yoon K.H. Koh S.-K.
Thin Solid Films, Vol. 368, Iss. 1, 2000-06 ,pp. :
By Tashiro J. Sasaki A. Akiba S. Satoh S. Watanabe T. Funakubo H. Yoshimoto M.
Thin Solid Films, Vol. 415, Iss. 1, 2002-08 ,pp. :
Ion-assisted deposition of silver thin films
By Lee C.-C. Lee T.-Y. Jen Y.-J.
Thin Solid Films, Vol. 359, Iss. 1, 2000-01 ,pp. :