![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Author: Lee C.-C. Lee T.-Y. Jen Y.-J.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.359, Iss.1, 2000-01, pp. : 95-97
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Room-temperature deposition of a-SiC:H thin films by ion-assisted plasma-enhanced CVD
Thin Solid Films, Vol. 283, Iss. 1, 1996-09 ,pp. :
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Ion-assisted deposition of C-N and Si-C-N films
By Carter G. He Z. Colligon J.S.
Thin Solid Films, Vol. 283, Iss. 1, 1996-09 ,pp. :