Formation of titanium nitride films by energetic cluster impact deposition

Author： Guoqing Y.   Jingsheng C.   Ying S.   Haochang P.   Dezhang Z.   Hongjie X.   Zhihao Z.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.335, Iss.1, 1998-11, pp. : 59-63

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Titanium nitride thin films obtained by a modified physical vapor deposition process

By LeClair P.   Berera G.P.   Moodera J.S.  

Thin Solid Films, Vol. 376, Iss. 1, 2000-11 ,pp. : 9-15

Elsevier

Access to resources Recommend Favorite

Deposition and properties of titanium nitride films produced by dc reactive magnetron sputtering

By Meng L.-J.   Dos Santos M.P.   Azevedo A.  

Vacuum, Vol. 46, Iss. 3, 1995-03 ,pp. : 233-239

Elsevier

Access to resources Recommend Favorite

Background of the titanium nitride deposition

By Szikora B.  

Vacuum, Vol. 50, Iss. 3, 1998-07 ,pp. : 273-276

Elsevier

Access to resources Recommend Favorite

Low temperature chemical vapor deposition of titanium nitride films from tetrakis(ethylmethylamido)titanium and ammonia

By Panda S.   Kim J.   Weiller B.H.   Economou D.J.   Hoffman D.M.  

Thin Solid Films, Vol. 357, Iss. 2, 1999-12 ,pp. : 125-131

Elsevier

Access to resources Recommend Favorite

Effect of N 2 addition on growth and properties of titanium nitride films obtained by atmospheric pressure chemical vapor deposition

By Huang H.H.   Hon M.H.  

Thin Solid Films, Vol. 416, Iss. 1, 2002-09 ,pp. : 54-61

Elsevier

Access to resources Recommend Favorite