Low temperature chemical vapor deposition of titanium nitride films from tetrakis(ethylmethylamido)titanium and ammonia

Author： Panda S. Kim J. Weiller B.H. Economou D.J. Hoffman D.M.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.357, Iss.2, 1999-12, pp. : 125-131

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