Computer controlled plasma source ion nitriding

Author: Deng X.   Wang Y.   Xu Z.   Wang D.   Lu W.   Zhang J.   Yang F.   Yan H.   Ma T.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.345, Iss.1, 1999-05, pp. : 104-107

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Abstract