Comparative study of the structural properties of nanocrystalline Ge:H plasma deposited onto the cathode and the anode using high hydrogen dilutions

Author： Chen K. Poulsen P.R. Wang M. Wang G. Feng D. Xu J. Li W.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.346, Iss.1, 1999-06, pp. : 91-95

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