A comparative study of the UV optical and structural properties of SiO 2 , Al 2 O 3 , and HfO 2 single layers deposited by reactive evaporation, ion-assisted deposition and plasma ion-assisted deposition

Author： Thielsch R.   Gatto A.   Heber J.   Kaiser N.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.410, Iss.1, 2002-05, pp. : 86-93

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Study of HfO 2 films prepared by ion-assisted deposition using a gridless end-hall ion source

By Gilo M.   Croitoru N.  

Thin Solid Films, Vol. 350, Iss. 1, 1999-08 ,pp. : 203-208

Elsevier

Access to resources Recommend Favorite

Laser damage dependence on structural and optical properties of ion-assisted HfO 2 thin films

By Alvisi M.   De Tomasi F.   Perrone M.R.   Protopapa M.L.   Rizzo A.   Sarto F.   Scaglione S.  

Thin Solid Films, Vol. 396, Iss. 1, 2001-09 ,pp. : 44-52

Elsevier

Access to resources Recommend Favorite

Relations between the optical properties and the microstructure of TiO 2 thin films prepared by ion-assisted deposition

By Leprince-Wang Y.   Souche D.   Yu-Zhang K.   Fisson S.   Vuye G.   Rivory J.  

Thin Solid Films, Vol. 359, Iss. 2, 2000-01 ,pp. : 171-176

Elsevier

Access to resources Recommend Favorite

Properties of TiO 2 films prepared by ion-assisted deposition using a gridless end-Hall ion source

By Gilo M.   Croitoru N.  

Thin Solid Films, Vol. 283, Iss. 1, 1996-09 ,pp. : 84-89

Elsevier

Access to resources Recommend Favorite

Evolution of texture of CeO 2 thin film buffer layers prepared by ion-assisted deposition

By Gnanarajan S.   Savvides N.  

Thin Solid Films, Vol. 350, Iss. 1, 1999-08 ,pp. : 124-129

Elsevier

Access to resources Recommend Favorite