Author： Akiyama M. Harada T. Xu C.-N. Nonaka K. Watanabe T.
Publisher： Elsevier
ISSN： 0040-6090
Source： Thin Solid Films, Vol.350, Iss.1, 1999-08, pp. : 85-90
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Access to resources
Recommend
Study of reactive DC magnetron sputtering deposition of AlN thin films
By Dechev D.A. Dimitrova V.I. Manova D.I.
Vacuum, Vol. 49, Iss. 3, 1998-03 ,pp. :
Optical properties of AlN thin films correlated with sputtering conditions
By Gadenne M. Plon J. Gadenne P.
Thin Solid Films, Vol. 333, Iss. 1, 1998-11 ,pp. :
Preparation of AlN thin films by nitridation of Al-coated Si substrate
By Huang J. Wang L. Shen Q. Lin C. Ostling M.
Thin Solid Films, Vol. 340, Iss. 1, 1999-02 ,pp. :