![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Author: Dechev D.A. Dimitrova V.I. Manova D.I.
Publisher: Elsevier
ISSN: 0042-207X
Source: Vacuum, Vol.49, Iss.3, 1998-03, pp. : 193-197
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Magnetron sputtering system stabilisation for high rate deposition of AlN films
By Akhmatov V. Fomin A.A. Selishchev S.V.
Vacuum, Vol. 49, Iss. 3, 1998-03 ,pp. :
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Deposition and properties of nickel oxide films produced by DC reactive magnetron sputtering
By Hotovy I. Huran J. Janik J. Kobzev A.P.
Vacuum, Vol. 51, Iss. 2, 1998-10 ,pp. :
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Aluminium nitride thin films deposited by DC reactive magnetron sputtering
By Dimitrova V. Manova D. Paskova T. Uzunov T. Ivanov N. Dechev D.
Vacuum, Vol. 51, Iss. 2, 1998-10 ,pp. :