Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD

Author： Hamelmann F.   Haindl G.   Schmalhorst J.   Aschentrup A.   Majkova E.   Kleineberg U.   Heinzmann U.   Klipp A.   Jutzi P.   Anopchenko A.   Jergel M.   Luby S.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.358, Iss.1, 2000-01, pp. : 90-93

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