X-ray photoelectron study of TiN/SiO 2 and TiN/Si interfaces

By Chourasia A.R.   Chopra D.R.  

Thin Solid Films, Vol. 266, Iss. 2, 1995-10 ,pp. : 298-301

Elsevier

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X-ray reflectivity analysis of thin TiN and TiO x N y films deposited by dual-ion-beam sputtering on (100)Si substrates

By Alvisi M.   Rizzo A.   Tapfer L.   Vasanelli L.  

Thin Solid Films, Vol. 298, Iss. 1, 1997-04 ,pp. : 130-134

Elsevier

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An X-ray diffraction study of epitaxial TiN/NbN superlattices

By Madan A.   Yashar P.   Shinn M.   Barnett S.A.  

Thin Solid Films, Vol. 302, Iss. 1, 1997-06 ,pp. : 147-154

Elsevier

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The microstructure and X-ray reflectivity of Mo/Si multilayers

By Andreev S.S.   Gaponov S.V.   Gusev S.A.   Haidl M.N.   Kluenkov E.B.   Prokhorov K.A.   Polushkin N.I.   Sadova E.N.   Salashchenko N.N.   Suslov L.A.   Zuev S.Y.  

Thin Solid Films, Vol. 415, Iss. 1, 2002-08 ,pp. : 123-132

Elsevier

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Residual stress determination in PECVD TiN coatings by X-ray diffraction: a parametric study

By Thomsen N.B.   Horsewell A.   Mogensen K.S.   Eskildsen S.S.   Mathiasen C.   Bottiger J.  

Thin Solid Films, Vol. 333, Iss. 1, 1998-11 ,pp. : 50-59

Elsevier

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