Strain near SiO 2 -Si interface revealed by X-ray diffraction intensity enhancement

Author: Emoto T.   Akimoto K.   Ishikawa Y.   Ichimiya A.   Tanikawa A.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.369, Iss.1, 2000-07, pp. : 281-284

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract