Effects of ion beam bombardment on electrochromic tungsten oxide films studied by X-ray photoelectron spectroscopy and Rutherford back-scattering

Author： Wong H.Y.   Ong C.W.   Kwok R.W.M.   Wong K.W.   Wong S.P.   Cheung W.Y.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.376, Iss.1, 2000-11, pp. : 131-139

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Reactively DC magnetron sputtered thin AlN films studied by X-ray photoelectron spectroscopy and polarised infrared reflection

By Manova D.   Dimitrova V.   Karpuzov D.   Yankov R.  

Vacuum, Vol. 52, Iss. 3, 1999-03 ,pp. : 301-305

Elsevier

Access to resources Recommend Favorite

X-ray photoelectron spectroscopy and spectral transmittance study of stoichiometry in sputtered vanadium oxide films

By Bhattacharya A.K.   Debauge Y.   Krishna M.G.  

Thin Solid Films, Vol. 312, Iss. 1, 1998-01 ,pp. : 116-122

Elsevier

Access to resources Recommend Favorite

Determination of the States of Oxidation of Metals in Thin Oxide Films by X-Ray Photoelectron Spectroscopy

By Alov N.  

Journal of Analytical Chemistry, Vol. 60, Iss. 5, 2005-05 ,pp. : 431-435

MAIK Nauka/Interperiodica

Access to resources Recommend Favorite

Elastic light scattering and electrochemical durability of electrochromic tungsten-oxide-based films

By Kullman L.   Ronnow D.   Granqvist C.G.  

Thin Solid Films, Vol. 288, Iss. 1, 1996-11 ,pp. : 330-333

Elsevier

Access to resources Recommend Favorite

Characterization of Thermally Oxidized SiO2/SiC Interfaces by Leakage Current under High Electric Field, Cathode Luminescence (CL), X-Ray Photoelectron Spectroscopy (XPS) and High-Resolution Rutherford Backscattering Spectroscopy (HR-RBS)

By  

Materials Science Forum, Vol. 2016, Iss. 858, 2016-06 ,pp. : 449-452

Trans Tech Publications

Access to resources Recommend Favorite